Plasmid DNA Purification
Plasmid DNA Solutions
GMP-grade plasmid DNA purification for mRNA and viral vector manufacturing. Our AEX capture and HIC/SEC polishing platform delivers > 90% supercoiled content with low endotoxin levels.
Plasmid DNA Purification Process
AEX capture + HIC/SEC polish workflow
1
1. Capture
Anion Exchange
~80%
Purity
2
2. Intermediate
HIC
~95%
Purity
3
3. Polish
SEC
>99%
Purity
Plasmid DNA Purification Workflow
AEX Capture + HIC/SEC Polish Strategy
AIEX Resins
HIC Resins
SEC Resins
Anion
Exchange
Capture
Buffer
Exchange
HIC
Intermediate
SEC
Polish
Formulation
Captures
pDNA by charge
Removes
RNA and
open-circle
plasmid
Critical Quality Attributes
Key specifications for GMP-grade plasmid DNA.
Supercoiled Content
>90%
Maximize biologically active supercoiled plasmid form
Endotoxin
<0.1 EU/μg
Critical for in vivo applications
gDNA Content
<1%
Minimize host cell genomic DNA contamination
RNA Content
<1%
Remove host cell RNA impurities
Recommended Products
Key resins for plasmid DNA purification workflows.